Hardware support: Texas's Samsung Fabs shut down due to power shortages

Recently , "Very Large Scale Integrated Circuit Manufacturing Equipment and Complete Processes" National Science and Technology Major Project ( 02 Special project) The Implementation Management Office organized experts to hold an acceptance meeting for the "Key Technology Research of Extreme Ultraviolet Lithography" at the Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences. The Institute of Optoelectronics undertook the project's topic 7 "Experiment on principles of extreme ultraviolet lithography" Development of equipment machinery and vacuum system". The evaluation expert group fully affirmed the series of results achieved by the project, unanimously agreed that the project passed the acceptance, and believed that the research work of the project provided strong support for the smooth implementation of the entire project, and accumulated the core technical foundation for the further development of extreme ultraviolet lithography.

Extreme Ultraviolet ( Ex treme Ultraviolet ， EUV ) Lithography is based on 13.5nm Projection lithography technology for exposure light source ， Recognized as the most promising next-generation lithography technology . "Research on Key Technologies of Extreme Ultraviolet Lithography" is a forward-looking research project aimed at breaking through the foreign technology blockade in the development of extreme ultraviolet lithography. The subject of "Experimental Device Machinery and Vacuum System Development for Extreme Ultraviolet Lithography Principles" undertaken by Optoelectronics is one of the important research contents of the project, which mainly solves the high-stability vacuum environment of the exposure device, active vibration reduction, automatic film transport system, and high-precision workpieces. Key technologies such as stage control and nanometer leveling and focusing measurement system are indispensable components for the integration and testing of extreme ultraviolet lithography exposure equipment. The system to be developed for this subject is complex, with many development contents and technical difficulties.

After eight years of hard work, the team of the General Research Laboratory of Microelectronics Equipment of the Institute of Optoelectronics has broken through key unit technologies such as vacuum, film transport, work table, vibration reduction and coke detection: the vacuum system achieves 5.8 × 10 -7 Torr Stable high vacuum environment ensures EUV The stability of light source propagation; the frame of the whole machine and the vibration reduction system reach YOU F Vibration reduction standard, horizontal direction 2.2Hz- 500Hz 、 Vertical direction 2Hz- 500Hz Good vibration isolation in frequency range , The stability of the frame, workpiece stage and mask stage meets 32nm Photolithography requirements and sub-nanometer wave aberration detection; the leveling and focusing detection system achieves nanometer detection accuracy, 32nm The reproducibility of lithography resolution provides a guarantee. at the same time, Workpiece table under development , On the existing basis, researched the multi-workpiece stage collaborative control technology, and solved the problem of simultaneous control and position switching between the wafer stage and the image table, the mask stage and the object stage; Automatic film feeding system realizes automatic loading and unloading in vacuum environment ; The software system completes multi-module complex control and coordinates the various sub-systems to complete the exposure process.

On the basis of completing the development of the key unit system, cooperate with the overall project unit Changchun Institute of Optics and Mechanics to achieve 32nm Repeatable exposure and sub-nanometer wave aberration detection with the Shanghai Institute of Optics and Mechanics have played a major role, and have been well received by the overall project unit, each subject unit and experts from the acceptance team. During the development of the subject, the research team has made a series of original achievements in the fields of workpiece table control and precision measurement technology, and has applied for invention patents. 31 Items, including domestic patents 28 Items, international patents 3 item.

The project passed the acceptance , Indicating that the overall research team of the Microelectronics Equipment of the Institute of Optoelectronics has become an important part of the extreme ultraviolet lithography research team in my country. At the same time, it also shows that China has now broken through EUV The core technology of lithography equipment research and development is EUV The next development of lithography has laid a solid technical foundation.

source: http://www.ioe.cas.cn/xwdt/kydt/201707/t20170712_4832184.html

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Chromebooks outsold Macs worldwide in 2020, cutting into Windows market share

Posted: 18 Feb 2021 02:06 AM PST

submitted by /u/RodionRaskoljnikov
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Has anyone gone into tinkering with older HW or SBCs lately due to shortages?

Posted: 17 Feb 2021 01:26 PM PST

I feel like due to the shortages and mining boom and whatnot, I think most of us have been basically bored about any new HW releases in terms of GPU or CPU releases.

I for one have started dabbling in older powermacs and modding them to run faster etc and I do think quite a lot of people just forget about getting anything in the current market tbh.

Just a thought

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Hardware support: Texas's Samsung Fabs shut down due to power shortages

Hardware support: Texas's Samsung Fabs shut down due to power shortages

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